FATraining

At FA applications, there are a lot of chances to localize defect by related laser-assisted techniques just like optical beam induced res...

At FA field, EDX (Energy dispersive X-ray spectroscopy) is one of the most important technology for elemental analysis or chemical charac...

In our FA procedure, nano machines or devices require manufacturing very small parts for their construction, and extracting small specime...

In the FA lab, there are many kinds of defect modes were revealed. The author classify systematically these defects and could be a gener...

For C-AFM utilization, tip parameters are most important to determine the image quality and I-V characteristic correctness. For example...

Laser-assisted device alteration (LADA) is a laser-based timing analysis technique used in the failure analysis of semiconductor devices...

Integrated circuits are getting more complicated all the time, necessitating a need for a wide variety of analysis techniques to figure o...

Seebeck effect  imaging (SEI) uses a laser to generate thermal gradients in  conductors . The thermal gradients induced generate corresp...

Thermally induced voltage alteration (TIVA) is an imaging technique which uses a laser beam to pinpoint the location of electrical short...

Optical beam induced resistance change (OBIRCH) is an imaging technique which uses a laser beam to induce a thermal change in the device...